Hydrogen-Assisted Enthalpy Modulation in SPPS for Controlled Growth of Vertically Oriented Metal Oxide Coatings for Gas Sensing Applications

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Dr. Xu Kaichun, kaichun.xu@utbm.fr, Yangzhou University, UTBM - Campus de Sevenans; Prof.Marie-Pierre Planche, marie-pierre.planche@utbm.fr, ICB UMR 6303, CNRS, Univ. Bourgogne Franche-Comté, UTBM, 90010 Belfort, France; Prof. Hanlin Liao, hanlin.liao@utbm.fr, ICB UMR 6303, CNRS, Univ. Bourgogne Franche-Comté, UTBM, 90010 Belfort, France; Prof. Chao Thang, zhangc@yzu.edu.cn, Yangzhou University

https://doi.org/10.53192/ITSC2026544

By tuning the thermal enthalpy input conditions—such as by regulating the input of hydrogen gas—it is possible to modulate the evaporation, crystallization, and growth behavior of solution precursors during the solution precursor plasma spray (SPPS) process. This strategy aims to fabricate metal oxide semiconductor (MOS)-based coatings with a vertically aligned morphology. Such unique nanostructured coatings are expected to offer enhanced surface area, gas diffusion pathways, and charge transport properties, making them highly promising for gas sensing applications.

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Erscheinungsdatum

March 2026

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